DOW FILMTEC™SG30-400 / 34i半导体级反渗透元件的开发旨在满足更高的整体抑制，更高的对较低分子量有机化合物和二氧化硅的抑制，以及加速TOC冲洗的要求。这种高表面积元件允许系统设计使用更少的元件和更低的施加操作压力，从而优化资本成本的摊销，同时降低运营成本.DOW FILMTEC SG30-400 / 34i元件采用独特的iLEC™互锁端盖，可减少系统运行成本，减少O形环泄漏的危险和产生导致水质差的小颗粒，并且不需要润滑剂.DOW FILMTEC SG30-400 / 34i主要用于传统UPW s中的抛光用途为高压操作而设计的系统。它具有34密耳的隔片，可减少整个容器结垢和压降的影响，增加清洗之间的运行时间并提高清洁效果。

DOW FILMTEC™ SG30-400/34i Semiconductor-Grade Reverse Osmosis Elements have been developed to meet the requirements of higher overall rejection, higher rejection of lower molecular weight organic compounds and silica, and an accelerated TOC rinse down profile. This high surface area element allows for system design with fewer elements and a lower applied operating pressure, thus optimizing amortization of capital costs while lowering operating cost. DOW FILMTEC SG30-400/34i elements feature the unique iLEC™ Interlocking End Caps that reduce system operating costs, reduce the risk of o-ring leaks and the generation of small particles that lead to poor water quality, and eliminate the need for lubricants. DOW FILMTEC SG30-400/34i is intended primarily for polishing use in traditional UPW systems designed for higher pressure operation. It features a 34-mil spacer to lessen the impact of fouling and pressure drop across a vessel, increasing running time between cleaning and enhancing cleaning effectiveness.

用于：高纯水优点：快速TOC冲洗性能高二氧化硅和硼废弃物良好的TOC排斥导致高品质的水，适用于微电子和制药行业iLEC™互锁端盖可提高生产率和可靠性利用34密耳间隔器减少污垢和压降可用性：亚太欧洲拉丁美洲北美

Used In:

High purity water

Advantages:

Quick TOC rinse down performance

High silica and boron rejections

Good TOC rejection resulting in high quality water suitable for microelectronics and pharmaceutical industries

iLEC™ Interlocking End Cap for better productivity and reliability

Utilizes a 34-mil spacer to lessen the impact of fouling and pressure drop

Availability:

Asia Pacific

Europe

Latin America

North America

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