AMBERJET™2000 H离子交换树脂是一种均匀的颗粒大孔强酸性阳离子交换树脂，专为发电凝结水抛光系统而设计。 AMBEJET 2000 H树脂在有机胺存在下表现出钠选择性的增加，使其特别适用于使用吗啉或乙醇胺（ETA）进行pH值控制的系统中的冷凝物净化。 AMBERJET 2000 H树脂可以在通常用于冷凝抛光机的高流速和压降条件下可靠运行。在混合床中使用时，树脂的颗粒大小和均匀性能够实现出色的反洗分离。高度交联的大孔树脂结构赋予AMBERJET 2000 H树脂好的抗物理，渗透和氧化应力的能力。氏s允许阳离子树脂的好大使用寿命，同时好小化有机磺酸盐可沥滤物的释放。 AMBERJET 2000 H树脂的高氧化稳定性和低滤出量也有助于保持混床抛光机中阴离子交换树脂的动力学响应。

AMBERJET™ 2000 H Ion Exchange Resin is a uniform particle size, macroporous, strong acid cation exchange resin designed for power generation condensate polishing systems. AMBEJET 2000 H resin exhibits an increase in sodium selectivity in the presence of organic amines, making it especially useful for condensate purification in systems that use morpholine or ethanolamine (ETA) for pH control. AMBERJET 2000 H resin can operate reliably under the high flow rate and pressure drop conditions that are typically used in condensate polishers. The particle size and uniformity of the resin allow for excellent backwash separation when used in mixed beds. The highy crosslinked macroporous resin structure give AMBERJET 2000 H resin exceptional resistance to physical, osmotic and oxidative stresses. This allows for maximum useful life of the cation resin, while minimizing the release of organic sulfonate leachables. The high oxidative stability and low leachables of AMBERJET 2000 H resin also help to preserve the kinetic response of the anion exchange resin in a mixed bed polisher.

用于：使用替代胺化学的发电凝聚抛光系统需要优异氧化稳定性的冷凝抛光系统优点：高物理稳定性好高氧化稳定性优异的分离效率：亚太欧洲拉丁美洲北美洲

Used In:

Power generation condensate polishing systems using alternative amine chemistry

Condensate polishing systems where superior oxidative stability is required

Advantages:

High physical stability

Highest oxidative stability

Excellent separation

Availability:

Asia Pacific

Europe

Latin America

North America

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