EPIC™ 2135 is designed for 65 nm node trench applications as well as advanced 90 nm node processes.

优点：优异的缺陷控制优异的线边缘粗糙度（LER）低掩模误差因子（MEF）保质期稳定性半密集到隔离线和沟槽能力典型属性脚注：Epic 2135专为65 Nm节点沟槽应用以及 90 Nm节点流程。可用性：亚太欧洲北美

Advantages:

Excellent defect control

Excellent line edge roughness (LER)

Low mask error factor (MEF)

Shelf-life stability

Semi-dense to isolated line and trench capability

Typical Properties

Footnote: Epic 2135 Is Designed For 65 Nm Node Trench Applications As Well As Advanced 90 Nm Node Processes.

Availability:

Asia Pacific

Europe

North America