IC1000™AT DEFECT REDUCTION PAD是一种抛光垫，采用先进的螺旋槽设计，除了在抛光平台上提供好佳的浆料输送外，还可实现均匀性改进并减少高达50％的缺陷。

IC1000™ AT DEFECT REDUCTION PAD is a polishing pad with an advanced spiral groove design that achieves uniformity improvements and reduces defects up to 50%, in addition to providing optimal slurry transport across the polishing platforms.

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