在Applied Materials Mirra和Reflexion抛光机平台上使用IC1010™超长寿命焊盘以获得好佳化学机械平面化（CMP）性能。 IC1010™垫是一种刚性微孔聚氨酯垫。

Use IC1010™ Longer Life Pad for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. IC1010™ pad is a rigid micro porous polyurethane pad.

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